马宏潇,厉 渊,徐 旻.一种优化等离子体刻蚀工艺去静电步骤的方式[J].集成技术,2019,8(2):37-42
一种优化等离子体刻蚀工艺去静电步骤的方式
Optimize the Step of Electrostatic Discharge in Plasma Etching Process
  
DOI:10.12146/j.issn.2095-3135.20181008002
中文关键词:  刻蚀;去静电;等离子体;残存电荷;良率
英文关键词:etch; de-chuck; plasma; residual charge; yield
基金项目:
作者单位
马宏潇 电信科学技术研究院 北京 100191 
厉 渊 中芯国际集成电路制造有限公司 北京 100176 
徐 旻 中芯国际集成电路制造有限公司 北京 100176 
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中文摘要:
      该文研究并优化了等离子体刻蚀后、去静电过程中等离子体辅助晶片去静电的工艺步骤。通 过数据模拟和实验设计,研究了极板间距、反应室压力、射频电源功率和射频电源关闭方式对晶片残存电荷的影响。首先,采用基于蒙特卡罗随机数方法的应用软件 Pegasus 对去静电过程中反应室内的等离子体分布进行了模拟,研究了等离子体能量分布图并分析了极板间距与等离子体分布均一性的关系,得到最佳极板间距范围。其次,以反应室压力、射频电源功率与极板间距为实验变量,通过实验设计得到残余电荷量最少的实验组。最后,以该实验组为基础,对射频电源的关闭方式进行优化,通 过检测晶片脱离吸附装置时的电势差,得到最优射频电源关闭方式。该文研究结果可用于优化晶片去静电步骤,进而提高工艺可靠性和产品良率。
英文摘要:
      In this paper, the process steps of plasma-assisted wafer destaticization after plasma etching and destaticization were studied and optimized. Through the data simulation and experimental design, the effects of plate spacing, reaction chamber pressure, radio frequency (RF) power supply and RF power off mode on the residual charge of the wafer were studied. Firstly, the plasma distribution of the reaction chamber in the destaticization process was simulated by Monte Carlo random number method based on software Pegasus. The plasma energy distribution map was studied and the plate spacing and plasma distribution uniformity were analyzed. The relationship had been obtained with the best range of plate spacing. Secondly, the reaction chamber pressure, RF power and plate spacing were used as experimental variables, and the experimental obtained. The results of this paper could be used to optimize the wafer destaticization step and improve process reliability and product yield. group with the lowest residual charge was obtained through experimental design. Finally, based on the experimental group, the RF power supply shutdown mode was optimized. By detecting the potential difference when the wafer was detached from the adsorption device, the optimal RF power supply shutdown mode was
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